Degradation by water vapor of hydrogenated amorphous silicon oxynitride films grown at low temperature

PDF) Oxidation processes in hydrogenated amorphous silicon nitride films deposited by ArF laser-induced CVD at low temperatures

Conformal growth and characterization of hafnium silicate thin film by MOCVD using HTB (hafnium tertra-tert-butoxide) and TDEAS (tetrakis-diethylamino silane)

Conformal growth and characterization of hafnium silicate thin film by MOCVD using HTB (hafnium tertra-tert-butoxide) and TDEAS (tetrakis-diethylamino silane)

PDF) Chemical and morphological properties of amorphous silicon oxynitride films deposited by plasma enhanced chemical vapor deposition

PDF) Stability of SiNx Prepared by Plasma-Enhanced Chemical Vapor Deposition at Low Temperature

PDF) Stability of SiNx Prepared by Plasma-Enhanced Chemical Vapor Deposition at Low Temperature

Conformal growth and characterization of hafnium silicate thin film by MOCVD using HTB (hafnium tertra-tert-butoxide) and TDEAS (tetrakis-diethylamino silane)

Nanomaterials, Free Full-Text

PDF) Oxidation processes in hydrogenated amorphous silicon nitride films deposited by ArF laser-induced CVD at low temperatures

The lateral correlation length ␰ versus film thickness d

Degradation by water vapor of hydrogenated amorphous silicon oxynitride films grown at low temperature

Micromachines, Free Full-Text

Conformal growth and characterization of hafnium silicate thin film by MOCVD using HTB (hafnium tertra-tert-butoxide) and TDEAS (tetrakis-diethylamino silane)